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Photolithography acidity function

Finally, it has to be discussed why certain chemically amplified resists (CARs), that are applied successfully in photolithography and function on the basis of radiation-induced acid generation, are applicable also in high-energy radiation lithography. Sulfonium and iodonium salts, such as those presented in Chart 5.14, are typical acid generators in this context. [Pg.310]

Figure 6.9 A schematic representation of orthogonal process for nanoparticles self-assembly (a) a patterned silicon wafer with Thy-PS and PVMP polymers fabricated through photolithography and (b) orthogonal surface functionalization through Thy-PS/DP-PS recognition and PVMP/acid-nanoparticle electrostatic interaction. Reprinted with permission from Xu et al. (2006). Copyright 2006 American Chemical Society. Figure 6.9 A schematic representation of orthogonal process for nanoparticles self-assembly (a) a patterned silicon wafer with Thy-PS and PVMP polymers fabricated through photolithography and (b) orthogonal surface functionalization through Thy-PS/DP-PS recognition and PVMP/acid-nanoparticle electrostatic interaction. Reprinted with permission from Xu et al. (2006). Copyright 2006 American Chemical Society.

See other pages where Photolithography acidity function is mentioned: [Pg.928]    [Pg.231]    [Pg.91]    [Pg.420]    [Pg.311]    [Pg.9]    [Pg.222]    [Pg.19]    [Pg.2201]    [Pg.62]    [Pg.200]    [Pg.53]    [Pg.364]    [Pg.366]    [Pg.367]    [Pg.371]    [Pg.375]    [Pg.521]    [Pg.542]    [Pg.307]    [Pg.1072]   
See also in sourсe #XX -- [ Pg.269 ]




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