Photolithography acidity function

Finally, it has to be discussed why certain chemically amplified resists (CARs), that are applied successfully in photolithography and function on the basis of radiation-induced acid generation, are applicable also in high-energy radiation lithography. Sulfonium and iodonium salts, such as those presented in Chart 5.14, are typical acid generators in this context. 

Figure 6.9 A schematic representation of orthogonal process for nanoparticles self-assembly (a) a patterned silicon wafer with Thy-PS and PVMP polymers fabricated through photolithography and (b) orthogonal surface functionalization through Thy-PS/DP-PS recognition and PVMP/acid-nanoparticle electrostatic interaction. Reprinted with permission from Xu et al. (2006). Copyright 2006 American Chemical Society.

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