Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Photoelectrons, escape characteristics

Figure 3. Escape characteristics of photoelectrons. Effective analysis... Figure 3. Escape characteristics of photoelectrons. Effective analysis...
The XPS mechanism, which can be used for quantitative and qualitative chemical analysis of surfaces, is based on the photoelectric effect. A monochromatic soft Mg or Al anode X-ray source is used to irradiate the surface. The absorbed X-rays ionize die core shell, and in response, the atom creates a photoelectron that is transported to the surface and escapes. The ionization potential of a photoelectron that must be overcome to escape into vacuum is the binding energy (BE) plus the work function of the material. The emitted photoelectrons have a remaining kinetic energy (KE), which is measured by using an electron analyzer. Individual elements can be identified on the basis of their BE. The resulting XP spectrum is a characteristic set of peaks for a specific element, with BE as the abscissa and counts per unit time as... [Pg.153]

See other pages where Photoelectrons, escape characteristics is mentioned: [Pg.197]    [Pg.421]    [Pg.262]    [Pg.77]    [Pg.62]    [Pg.107]    [Pg.10]    [Pg.24]    [Pg.34]    [Pg.326]    [Pg.326]    [Pg.124]    [Pg.198]    [Pg.66]    [Pg.195]    [Pg.229]    [Pg.262]    [Pg.339]    [Pg.4600]    [Pg.111]    [Pg.383]    [Pg.194]    [Pg.257]    [Pg.190]    [Pg.618]    [Pg.414]    [Pg.224]   
See also in sourсe #XX -- [ Pg.355 ]



SEARCH



ESCAP

© 2024 chempedia.info