Photodegradation of Organosilane SAMs by VUV Light

The schematic diagram of the VUV irradiation apparatus is shown in Fig. 12. We used ODS-SAM as a sample. First, the sample was set in a vacuum chamber 

The photodegradation rate at 103Pa is much bigger than that at 10 Pa as shown in Fig. 13. This expresses the important role of oxygen played in photodegradation, and also draws a proof of the existence of oxygen at the 

These oxygen radicals have high oxidation power to organic materials and react immediately with free radicals generated by the photocutting reaction. By these reactions the SAM is removed from the substrate as volatile molecules, such as CO, C02 and H20. 

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