Photochemical vapor deposition

Instead of the conventional adiabatic PCVD described above, the DP-CP generated at a fiber probe tip enables a novel PCVD because the molecule can transit from Eg el)0 Ei vib) to Eg el)0 by absorbing the DP-CP energy even 

This relation was confirmed experimentally by measuring the values of b ja and cjh, which were found to be on the order of 10 , thus supporting the validity of the theory based on the DP-CP picture [50]. 

On the basis of the dressed photon theory and the important role of electric dipole-forbidden molecular vibrational excitations, recent theoretical studies have proposed a simple model to describe atom or atom-cluster desorption due to the dressed photons from a nanometric particle deposited on a substrate [49]. Assuming an anharmonic potential for each atomic binding, an effective atom-nanodot potential was evaluated to determine the desorption energy and the stabilized dot size. The model shows that electric dipole-forbidden molecular vibrational excitations play an important role in the phonon-assisted process, which could potentially lead to a novel fabrication method, in addition to controlling the size and position of nanostructures [51]. 

---

Excimer lamps have opened the possibiHty of cost-effective large-area direct photochemical vapor deposition (PCVD). PCVD of stoichiometric, insulating Si02 onto Si wafer has been reported using SiH and N2O as gas-phase precursors and the 172-nm radiation from a Xe 2 lamp (54). Deposition... 

J. G. Eden (ed.), Photochemical Vapor Deposition, John Wiley and Sons, New York (1992), pp 5-8. 

Laser molecular beam epitaxy, fabrication method for inorganic materials, 7 415t Laser photochemical vapor deposition (LPCVD), 19114-116 Laser pointers, 14 678 Laser-promoted dehydrohalogenation,... 

Lanthanide triflates, for allylic tin reactions, 9, 354 Laser beam heating, in metal vapor synthesis, 1, 224 Laser methods, in mechanistic studies, 1, 248 Laser photochemical vapor deposition, with organometallic complexes, 1, 259... 

Figure 3.25 CVD versus photochemical laser deposition (a) uniform film formation (b) focused laser beam causes photochemical vapor deposition to occur only at the laser beam tip indicated by the arrow.

Photochemical vapor deposition SiH4 + N2O Si02 SiH4 + NH3 Si3N4... 

Parada EG, Gonzalez P, Pou J, Serra J, Fernandez D, Leon B, Perez-Amor M (1996) Aging of photochemical vapor deposited silicon oxide thin films. J Vac Sci Technol A 14 436 - 40 Rabinovich EM, Jackson KA, Kopylov NA (1990) Continuous casting of particnlate silica gels. Mater. Res. 

---