Photoalignment light source

Table 3.4 summarizes light sources for photoalignment. The critical wavelengths for photoalignment depend on the principle involved and the material. Only small... 

In this section we estimate the cost of new machines and maintenance when a photoalignment process replaces the present rubbing process. We assume the panel size to be 300 mm x 400 mm, and the light source is a high pressure mercury lamp. 

Ushio Ltd. in Japan developed a light source for photoalignment exposure. Its basic configuration is the same as for photolithography. However, photoalignment requires a large exposure area and a polarization element. Ushio s equipment uses... 

An exposure system for fabricating optical film by exposing a pattern such as for photoalignment, where the optical film has a photosensitive layer and a substrate. The exposure system directs an exposure beam from a light source to a reflective polarization modulation device. The modulated exposure beam is then reflected onto the photosensitive medium for forming a pattern onto the optical film. 

A system is provided in which an expanded non-collimated source of light may be used to produce a uniform polarized light exposure for use, for example, in the photoalignment of optical films. Uniformity of polarization and intensity may be maintained even when a high-intensity source of ultraviolet light is used. The system may be scaled in size to produce... 

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