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Photoablation of Polymers

In previous years studies on the photoablation of polymers for etching purposes have been few. Over the last twelve months however, this area of work has expanded enormously and may be an indication of its commercial fruition. A dynamic model has been proposed for the laser ablation of polymer systems which implicates the successive absorption of two or more photons causing population to higher electronic excited states . In this work the excitation time of laser pulses was stepped and indicated that short-lived radicals play an important role in ablation. The wavelength of the... [Pg.472]

Several areas of conflict and uncertainty remain in the fleld of polyolefln photo-oxidation. This year has seen a massive increase in studies of the photoablation of polymers for etching purposes. This doubtless reflects the possibilities of industrial applications. [Pg.565]


See other pages where Photoablation of Polymers is mentioned: [Pg.380]    [Pg.360]    [Pg.448]    [Pg.543]    [Pg.545]    [Pg.547]    [Pg.549]    [Pg.551]    [Pg.553]    [Pg.555]    [Pg.557]    [Pg.559]    [Pg.561]    [Pg.563]    [Pg.565]    [Pg.567]    [Pg.360]    [Pg.265]    [Pg.380]   


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Photoablation

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