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Pattern width

Tire Tire Construction kso(N/rad) = 60000 Tread Pattern Pattern width/tire width = 0.78... [Pg.752]

Friction coefficient 1 Pattern width/tire width 0.76... [Pg.754]

This dialog box allows us to choose the color, pattern, width, and symbol for the trace. I will choose a very thick dashed black line for this trace (you should choose something else) ... [Pg.142]

The positive image so formed had a pattern width of 0.5 p and a y-value of 5. Thus, the degraded polymer was found to achieve an approximately equal resolution at a lower exposure dose, as compared with poly(methyl methacrylate) (PMMA) known as a conventional image forming material (26). [Pg.127]

Hydromorphological monitoring generally relies on series of elements such as assessment of quantity and dynamics of flow, connections to groundwater, continuity, channel patterns, width/depth variations, substrate conditions, structure and condition of the riparian zone in the case of rivers, residence time, lake depth variation, tidal flow regime, substrate condition and structure and condition of the intertidal zone, freshwater flow regime and direction and speed of dominant currents for transition/coastal waters. [Pg.42]

Conical nozzles use deflectors to generate a cone-shaped pattern as shown in the schematic in Fig. 7. Pattern widths can vary from as small as about 2.5 cm (1 in.) to approximately 60 cm (2 ft) in diameter, depending on the size and the radius of the deflector. The size of the pattern also depends on the powder flow rate. Conical nozzles generate a softer spray pattern because the deflector creates a partial vacuum that pulls the inner part of the cone pattern toward itself This reduces the forward velocity of the powder. Conical nozzles are usually used in manual coating operations, where they are used for large flat parts and complex shapes. [Pg.2411]

If speed is an obstacle to the wide application of scanning probe techniques as surface modification tools, their resolution keeps them in the running. The resolution of the patterns formed by the SECM depends on the size and geometry of the UME, as well as the distance it is held above the surface. At the same time, the resolution of the patterns can easily be controlled (as compared to other SPM techniques) by approaches such as the chemical lens. Pattern width can be controlled merely by varying the electrolyte and the surface-UME distance. The UME need not be altered. [Pg.624]

Figure 11 The Hahn-echo MAS SSNMR spectra of anatase Ti02, as acquired at three different magnetic fields, are shown. Note the pronounced reduction in powder pattern widths and gains in S/N and resolution as the magnetic field strength Increases. Reprinted with permission from Ref. [m]. Copyright 2008 American Chemical Society. Figure 11 The Hahn-echo MAS SSNMR spectra of anatase Ti02, as acquired at three different magnetic fields, are shown. Note the pronounced reduction in powder pattern widths and gains in S/N and resolution as the magnetic field strength Increases. Reprinted with permission from Ref. [m]. Copyright 2008 American Chemical Society.
Figure 13. AFM images of patterned PPV in (a) nanowires(width 75 nm, height 4.5 nm), (b) nanowells (width 230 nm. Height 16 nm, wall thickness 75 nm) and (c) carbonized PPV nano patterns (width 386 nm, height 3.5 nm). Figure 13. AFM images of patterned PPV in (a) nanowires(width 75 nm, height 4.5 nm), (b) nanowells (width 230 nm. Height 16 nm, wall thickness 75 nm) and (c) carbonized PPV nano patterns (width 386 nm, height 3.5 nm).
The numerical simulation was consistent with experimental data with regards to influences of substrate pattern width, polymer weight ratio and polymer molecular weight of PAA. Both, experimental and simulated results showed that the intrinsic characteristic length should be compatible with the substrate pattern size for a reflned phase separation pattern, according to the substrate pattern. Simulations also showed that the increase in polymer molecular weight can increase the speed of morphologic evolution. As the film thickness is very small the checkerboard structure of spinodal decomposition cannot be seen in these results, but they are present. [Pg.513]

Figure 5.14 Near-field X-ray lithography. Schematic illustrations, (a) Method. The aerial image in the middle shows the absorbed dose in the resist. C, distance between mask and resist to pattern width at the development level selected W width of the mask feature (b) Feature... Figure 5.14 Near-field X-ray lithography. Schematic illustrations, (a) Method. The aerial image in the middle shows the absorbed dose in the resist. C, distance between mask and resist to pattern width at the development level selected W width of the mask feature (b) Feature...

See other pages where Pattern width is mentioned: [Pg.127]    [Pg.74]    [Pg.314]    [Pg.405]    [Pg.408]    [Pg.220]    [Pg.2411]    [Pg.101]    [Pg.416]    [Pg.318]    [Pg.64]    [Pg.191]    [Pg.328]    [Pg.270]    [Pg.26]   
See also in sourсe #XX -- [ Pg.405 , Pg.408 ]




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