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Patents photosensitive materials

Zakrevskyy Y, Faxil CFJ, Stumpe J. 2006b. Film forming photosensitive materials for the light induced generation of optical anisotropy. Patent Application W02006/117403 Al. [Pg.94]

In the ten years that followed after the expiration of the basic application patent of Xerox , very photosensitive phthalocyanine compounds were developed and phthalocyanine OPCs became the leading materials for this application. [Pg.271]

Ozin GA, Godber J, Stein A (1990) Photosensitive, radiation sensitive, thermally sensitive and pressure sensitive silver sodalite materials, US Patent 4 942 119... [Pg.336]

See other pages where Patents photosensitive materials is mentioned: [Pg.247]    [Pg.329]    [Pg.218]    [Pg.748]    [Pg.245]    [Pg.382]    [Pg.368]    [Pg.362]    [Pg.68]    [Pg.327]    [Pg.352]    [Pg.213]    [Pg.230]    [Pg.253]    [Pg.68]    [Pg.327]    [Pg.198]    [Pg.161]    [Pg.177]    [Pg.176]    [Pg.586]    [Pg.84]    [Pg.136]   
See also in sourсe #XX -- [ Pg.245 , Pg.246 ]



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