Partial cross section Subject

As an illustration of expression (8.22) for the chemical potential of a migrating interface, consider the spherically symmetric configuration in which a material undergoes a stress-free isotropic volumetric strain Sem > 0 at a material point as the interface S passes that point. As a result, the mismatch strain behind the interface is e = —emSij relative to the material in front of the interface. The system is depicted in cross-sectional view in Figure 8.5. The elastic material within 0 < r < i is subject to the mismatch strain efj, but the elastic strain is partially relaxed from this level due to the compliance of the surrounding material. The material within R < r < oo... 

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