Oxygen-plasma-assisted growth

Osterwalder, J., T. Droubay, T. Kaspar, J. Williams, C.M. Wang and S.A. Chambers (2005). Growth of Cr-doped Ti02 films in the rutile and anatase structures by oxygen plasma assisted molecular beam epitaxy. Thin Solid Films, 484(1-2), 289-298. 

Another method for production of ceria films is by oxygen-plasma-assisted molecular beam epitaxy (OPA-MBE). This method has been reviewed by Chambers.The advantage of the oxygen assisted plasma technique is that for certain films the dissociation of O2 is limiting in the growth of fully oxidized films. By use of a plasma source of oxygen, O atoms and ions are provided to the... 

Figure 13.19 Reprinted from Gao, W., Klieb, R., and Altmana, E.I. (2005) Growth of anatase hlms on vicinal and flat LaAlOs (110) substrates by oxygen plasma assisted molecular beam epitaxy, Thin Solid Films 485, 115, Copyright 2005. With permission from Elsevier.

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