Orthogonal self-assembly process

Figure 6.9 A schematic representation of orthogonal process for nanoparticles self-assembly (a) a patterned sihcon wafer with Thy-PS and PVMP polymers fabricated through photolithography and (b) orthogonal surface functionahzation through Thy-PS/DP-PS recognition and PVMP/acid-nanoparticle electrostatic interaction. Reprinted with permission from Xu et al. (2006). Copyright 2006 American Chemical Society.

The orthogonal formation of self-assembled polymers is a convenient way to prepare nanosized p- and n-type fibers that coexist in a single system while starting from a mixed solution of electron donor and acceptor building blocks, respectively. An elegant example reported by Mullen et al. shows the ability to prepare a doublelayered heterojunction by processing a chloroform solution of a hexaphenyl-substituted hexabenzocoronene (HBC) and a perylene bisimide (FBI) derivative. The phase separation between the two systems is a direct consequence of... 

---