Organic vapor phase deposition OVPD

Organic vapor phase deposition (OVPD) was invented by S. Forrest at Princeton University to transfer all the benefits of the gas phase process to applications in organic electronics. OVPD technology has the potential to overcome the limitations of VTE, similar to the replacement of MBE by MOCVD. 

D nanoribbons and nanowires of different metal-containing Pcs have also been prepared by organic vapor-phase deposition (OVPD), a technique used to fabricate organic millimeter-sized crystals, thin films, or nanostructures [211], Scanning electron microscopy (SEM), TEM, x-ray diffraction (XRD), and absorption measurement studies have revealed that the morphology of the nanostructures was strongly dependent on the chemical nature of the deposited macrocycle, the nature and the temperature of the substrate, and the source-to-substrate distance. 

An alternative to thermal evaporation which has been developed is organic vapor phase deposition. In OVPD, an evaporated small molecule is entrained into a controlled inert gas jet from which it is deposited onto the substrate. The process gives excellent control over the morphology and characteristics of the deposited film [48]. This deposition can be performed as a blanket operation using a showerhead or using a small nozzle which can be translated and the gas get pulsed to create a defined device pattern with almost any small molecule material [105]. 

---