Optical etching

Incorporation of cyclic aliphatic (aUcycHc) side groups markedly improves the plasma etch resistance of acryhc polymers, without reduciag optical transparency at 193 nm (91). Figure 32 presents stmctures of some acryhc polymers currendy under study for use ia 193-nm CA resists (92—94). Recendy, polymers with main-chain aUcycHc stmctures have been described that offer similar properties (95,96). 

Similar to prepared metallographic samples, the injection molded samples were cut along the flow direction, smoothed, and polished in order to expose their internal surface. After proper etching, the treated surfaces of the flank cross-section were photographed using a polarized light optical microscopy. Based on the color differences between the TLCP and matrix, volume fraction and aspect ratio of the TLCP fibers were measured [23]. 

Figure 5.14 The microstructure of the set cement is clearly revealed by Nomarski reflectance optical microscopy. Glass particles are distinguished from the matrix by the presence of etched circular areas at the site of the phase-separated droplets (Barry, Clinton Wilson, 1979).

De Souza et al. (1997) used spectroscopic ellipsometry to study the oxidation of nickel in 1 M NaOH. Bare nickel electrodes were prepared by a series of mechanical polishing followed by etching in dilute HCl. The electrode was then transferred to the spectroelectrochemical cell and was cathodicaUy polarized at 1.0 V vs. Hg/HgO for 5 minutes. The electrode potential was then swept to 0.9 V. Ellipsometry data were recorded at several potentials during the first anodic and cathodic sweep. Figure 27.30 shows a voltammogram for Ni in l.OM NaOH. The potentials at which data were recorded are shown. Optical data were obtained for various standard materials, such as NiO, a -Ni(OH)2, p-Ni(OH)2, p-NiOOH, and y-NiOOH. 

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