Nanowire photonics, integration with

Figure 11.11. Integration of nanowire photonics with silicon electronics. Schematic illustrating fabrication of hybrid structures. A silicon-on-insulator (SOI) substrate is patterned by standard electron-beam or photolithography followed by reactive ion etching. Emissive NWs are then aligned onto the patterned SOI substrate to form photonic sources. [Reprinted with permission from Ref. 59. Copyright 2005 Wiley-VCH Verlag.]...

Light-emitting ID nanomaterials made by conjugated potymers have unique features because they combine optoelectronic properties of semiconductors with structural properties of potymers. Organic nanowires, nanofibers, and nanotubes can be produced by different techniques, including template-assisted synthesis and vacuum sublimation. However, the lowthroughput of many of these approaches limits their application in photonic integrated systems. 

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