Nanoscale secondary ion mass spectrometry

In this chapter, the application of secondary ion mass spectrometry (SIMS) techniques, and in particular of time-of-flight secondary ion mass spectrometry (ToF-SIMS) and nanoscale secondary ion mass spectrometry (NanoSIMS), to polymer surface characterization is presented, with attention focused especially on polymer blends and interfaces. 

NanoSIMS is nanoscale secondary ion mass spectrometry technique that allows precise, spatially explicit, elemental and isotopic analysis down to 50 nm resolution [155]. When working in dynamic conditions, NanoSIMS analysis is a destructive process that involves the continuous bombardment of a sample with an energetic ( 16 keV) ion beam (either a Cs" " or O" " primary beam to enhance negative or positive ion formation, respectively), which results in sputtering of the upper sample surface and the consequent liberation of secondary ions. 

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