Movchan-Demchishin

Movchan-Demchishin (MD) diagram (film growth) A stmcture zone model of atomisti-cally deposited vacuum condensates. See also Structure zone models (SZM). 

In order to characterise the morphology of deposit, several models have been proposed the structure zone model (SZM model) was first proposed by Movchan and Demchishin in 1969 [9], Based on the observation of the microstructure characteristics of Ti, Ni, W, Zr02 and A1203 coatings by electron beam evaporation, they established the structure zone model in terms of three zones, which was used to describe the relationship between the morphology and the processing... 

Figure 6.3. Structure zone model (a) Movchan and Demchishin model [9] and (b) Thornton model Till...

Movchan BA, Demchishin AV (1969) Investigations of the structure and properties of thick Ni, Ti, W, A1203 and Zr02 vacuum condensates. Phys Met Metallogr (USSR) 28 83-90... 

Movchan, B. A. and Demchishin, A. M. (1969), Structure and properties of sick vacuum-condensates of nickel, titanium, tungsten, aluminum oxide and zirconium oxide, Ficika Metallov I Metallovedenie 28, 653-660. 

Bunshah RF, Nimmagadda R, Dunford W, Movchan BA, Demchishin AV, Chursanov NA. Structure and properties of refractory compounds deposited by electron beam evaporation. Thin Solid Films 54 85, 1978. 

Figure 10.6 Structure Zone Model (SZM) of Vacuum Evaporated Condensates. Adapted from Movchan and Demchishin (1969)P I...

The microstructure and morphology of thick single phase films have been extensively studied for a wide variety of metals, alloys and refractory compounds. The structural model was first proposed by Movchan and Demchishin Figure 14 was subsequently modified by Thornton (Figure 15). Movchan and Demchishin s diagram was arrived at from their studies on deposits of pure metals and did not include the transition zone of Thornton s model. Zone T. This is not prominent in pure metals or single phase alloy deposits but becomes quite pronounced in deposits of refractory compounds or complex alloys produced by evaporation and in all types of deposits produced in the presence of partial pressure of inert or reactive gas, as in sputtering or ARE type processes. 

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