Methyl Isopropenyl Ketone, Inhibited

Methyl Isopropenyl Ketone, Inhibited Methyl N-Butyl Ketone Iso-Amyl Nitrite Isovaleraldehyde... [Pg.64]

METHYL ISOPROPENYL KETONE, INHIBITED 2-Methyi-l-butene-3-one Flammable Liquid, II 2 - 0... [Pg.105]

Methyl Isopropenyl Ketone, Inhibited — Fire Hazards Flash Point (deg. F) < 73 CC ... [Pg.400]

SYNS 3-METHYL-3-BUTEN-2-ON (GERMAN) 2-METHYL-1-BUTEN-3-ONE METHYL ISOPROPENYL KETONE INHIBITED (DOT)... [Pg.930]

METHYL ISOPROPENYL KETONE see MKY500 METHYL ISOPROPENYL KETONE INHIBITED (DOP see MKY500... [Pg.1775]

Compound Name Methyl Isobutyl Ketone Methyl Isopropenyl Ketone, Inhibited P-Cymene... [Pg.153]

Methyl Isopropenyl Ketone, inhibited 1246 26 Monochloroacetic Acid, liquid 1750 59... [Pg.729]

Various materials have been examined for use as deep UV resists poly(methyl methacrylate) (PMMA) (1), poly(methyl isopropenyl ketone) (PMIPK) fS.7L and the novolak-Meldrum s acid solution inhibition system (S). Each however has a problem related to sensitivity and/or resolution. While PMMA is insensitive to light of X > 230 nm because of its weak absorption, its high resolution properties make it an attractive starting point for the design of a resist that will perform well in the 230-280 region. The photochemical properties of PMMA could be modified by the incorporation of a small percentage of photolabile groups so as to have both the desired sensitivity and base polymer properties. [Pg.29]

Both UV- and y-irradiation have been applied successfully for the initiation of methyl isopropenyl ketone [349-351] and phenyl vinyl ketone polymerization [341]. Since polymerization initiated by y-irradiation was inhibited by chinone, a radical mechanism was proposed. [Pg.641]

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