Mask transfer

Figure 1. Process flow (1) photolithography (may include an optional step of negative mask transfer by barrier-type anodization), (2) porous-type anodization, (3) chemical etching of either (3a) porous AI2O3 or (3b) Al.

Undermask Anodization During Localized Anodization of A1 and Fidelity of the Mask Transfer... 

This section will review selected applications and devices produced by using localized porous-type anodization and, optionally, selective etching of either porous AI2O3 or Al. The fabrication of these devices shares the common technological issues and challenges discussed in Sect. Ill the choice of a reliable mask material, the fidelity of the mask transfer, the trapezoidal profile of metallic features, the... 

EMM can be applied to either Al films, typically deposited on SiCVSi substrates, or Al foils. The dimensions of metallic features are determined by the same rules the etch factor, the depth of porous-type anodization, the mask design, and process conditions. In addition to the fabrication of metallic microstructures, EMM can be used to produce microstructured ceramic substrates composed of porous AI2O3. For the fabrication of both types of 3D microstructures by localized porous-type anodization, the following technological problems have to be addressed the reliability of a mask material, the fidelity of the mask transfer, volumetric expansion of porous AI2O3 during anodization, and the effect of the mask design on the rate of porous-type anodization and on the completion of anodization of the entire thickness of Al without traces of Al islands. 

Acetylene is also protected as propargyl alcohol (300)[2H], which is depro-tected by hydrolysis with a base, or oxidation with MnOi and alkaline hydrolysis. Sometimes, propargyl alcohols are isomerized to enals. Propargyl alcohol (300) reacts with 3-chloropyridazine (301) and EtiNH to give 3-diethylami-noindolizine (303) in one step via the enal 302[2I2]. Similarly, propargyl alcohol reacts with 2-halopyridines and secondary amines. 2-Methyl-3-butyn-2-ol (304) is another masked acetylene, and is unmasked by treatment with KOH or NaOH in butanol[205,206,213-2l5] or in situ with a phase-transfer cata-lyst[2l6]. 

Fig. 1. The hthographic process. A substrate is coated with a photosensitive polymer film called a resist. A mask with transparent and opaque areas directs radiation to preselected regions of the resist film. Depending on resist characteristics, exposed or unexposed portions of the film are removed using a developer solvent. The resulting pattern is then transferred to the substrate surface and the resist is stripped.

While the carbon dioxide/caiistic test method has become accepted, one should use the results with caution. The chemical reaction masks the effect of physical absorption, and the relative values in the table may not hold for other cases, especially distillation applications where much of the resistance to mass transfer is in the gas phase. Background on this combination of physical and chemical absorption may Be found earher in the present section, under Absorption with Chemical Reaction. ... 

This considerable enhancement in redox properties may however remain chemically hidden. Several causes may converge to mask these properties. First of all electron transfer is an intermolecular act of reactivity even when thermodynamically feasible it may have to compete with very rapid intramolecular acts of deactivation (fluorescence, phosphorescence, internal conversion)99. The rate of electron transfer is given by the Rehm-Weller equation96,100... 

These simple situations can be embellished. For example, the axial dispersion model can be applied to the piston flow elements. However, uncertainties in reaction rates and mass transfer coefficients are likely to mask secondary effects such as axial dispersion. 

The spatio-temporal variations of the concentration field in turbulent mixing processes are associated wdth very different conditions for chemical reactions in different parts of a reactor. This scenario usually has a detrimental effect on the selectivity of reactions when the reaction time-scale is small compared with the mixing time-scale. Under the same conditions (slow mixing), the process times are increased considerably. Due to mass transfer inhibitions, the true kinetics of a reaction does not show up instead, the mixing determines the time-scale of a process. This effect is known as mixing masking of reactions [126]. 

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