Magnetron discharge for LCVD

The rate of sputtering of aluminum from the electrode used in a magnetron plasma polymerization system is dependent on the plasma energy density, which can be stipulated by the external parameter Vjp, which is the acceleration potential in the vicinity of the cathode, for Ar discharge, while the deposition of CH4 is dependent on WjFM in joules per kilogram of CH4 for LCVD as described in Chapter 8. 

It is important to recognize that all surfaces that contact with the luminous gas phase participate and influence LCVD operation. Therefore, in principle, in a batch operation, the first run with clean reactor wall could not be replicated in the second run with contaminated reactor wall. Thus, it is necessary to include the step for cleaning the reactor. If only hydrocarbons were used in an LCVD, the cleaning could be done by O2 discharge prior to the normal LCVD operation. (The influence of wall contamination was described in Chapter 10.) In this respect, the effort to minimize the deposition on nonsubstrate surfaces is important even in batch operation of LCVD. Magnetron discharge is quite effective in this respect, as described in Chapter 14. 

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