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Macromolecular architectures for microlithography

The Preparation and Investigation of Macromolecular Architectures for Microlithography by Living Free Radical Polymerization... [Pg.144]

Barclay, G. G., et al. (1998). The preparation and investigation of macromolecular architectures for microlithography by living free radical polymerization. ACS Symp. Ser., 706(Micro- and Nanopatterning Polymers) 144—160. [Pg.933]

The dissolution behavior of copolymers in aqueous base is of primary importance in photoresist performance. As microlithography continues to decrease in exposure wavelength and the minimum feature size required from photoresist compositions decreases below 0.20 pm, control of macromolecular architecture will play an increasingly significant role. That is, how does the random, alternating or "blocky nature of the matrix polymer effect its solubility in aqueous base. It has been well documented for novolac based photoresists that the molecular weight distribution... [Pg.144]

See other pages where Macromolecular architectures for microlithography is mentioned: [Pg.144]   
See also in sourсe #XX -- [ Pg.144 , Pg.145 , Pg.146 , Pg.147 , Pg.148 , Pg.149 , Pg.150 , Pg.151 , Pg.152 , Pg.153 , Pg.154 , Pg.155 , Pg.156 , Pg.157 , Pg.158 ]



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Macromolecular architectures for

Microlithography

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