Local metal deposition defect induced

FIGURE 36.1 Schematic illustration of some electrochemical techniques employed for surface nanostructuring (a) tip-induced local metal deposition (b) defect nanostructuring (c) localized electrochemical nucleation and growth d) electronic contact nanostructuring. 

Electron polarization frequently happens at sites surrounding atoms with even lower atomic CNs than that of a flat surface, namely four. As a consequence of the local polarization and entrapment, transition from conductor to semiconductor happens to small clusters such as 3-nm-sized A1 nanoislands deposited on Si substrate [1]. The broken-bond-induced densification and localization of electrons with lowered binding energy in the traps have been observed as defect states [2], chain end states [3, 4], terrace edge states [5-7], and surface states [8-10]. Strong localization of excess electrons also happens to the surface of ice [11] and metal films [12]. 

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