Lithographic Applications of Photopolymerization Negative Resists

Photoinitiated polymerization in negative resists used in lithography has found its main applications in lithographic offset plates in dry resists used in the printing of 

Reiser, Photoactive Polymers The Science and Technology of Resists, p. 154, John Wiley Sons, Hoboken, NJ (1989). 

All lithographic imaging using photopolymerization negative resists relies on the difference between the solubility of the starting resin compositions and the cross-linked form. Following the methods of Delzenne and co-workers 

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