LCVD in Closed Reactor

In contrast, DC cathodic polymerization in a closed system seems to be the most efficient way to operate plasma deposition in a large IVD reactor. In such a 

In order to explore the possibility of efficiently operating plasma deposition in an industrial IVD reactor, DC cathodic polymerization of TMS in a closed system mode under conditions similar to the IVD operation was investigated. The corrosion protection properties of the plasma coatings obtained under such operation were also studied on IVD Al-coated A1 alloys. 

In a flow system plasma polymerization, the system pressure is continuously adjusted by controlling the opening of a throttle valve connected to the pumping system. Because of fragmentation of original monomer in a plasma state, the composition of gas phase changes on the inception of the plasma state. The increase in the total number of gas molecules is compensated by the increased pumping rate in a flow system, and a steady-state flow of a consistent composition of gas phase is established at a predetermined system pressure. 

Considering that the system pressure continues to increase after most of the polymerizable species are exhausted in the gas phase, plasma polymerization of TMS in a closed system can be visualized as a time-delayed, consecutive application of three fundamental processes. The sequence takes the order (1) deposition of Si species, (2) deposition of C species, and (3) H2 plasma treatment of the deposited plasma polymer. 

The O2 plasma treatment on the TMS film is seen to significantly reduce the incorporation of carbon in the outer region of the TMS plasma films (including both closed system and flow system TMS polymers) and change the surface from a carbon-rich state to one rich in Si02 bonding. This result indicates that the O2 

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