Ion implantation integrated circuits

Chemical and Physical Processing of Ion-Implanted Integrated Circuits... 

A brief overview of the fundamentals of the chemical and physical processing of ion-implanted integrated circuits is presented. Although not intended as a thorough review paper in the field, a modest list of references are provided to which the reader may refer for more in-depth discussions of the topics covered. As well as an overview of the principles of ion-implantation, profile shaping as a means of improving device performance is discussed. Typical applications of ion-implantation in silicon and gallium arsenide devices are also covered. 

Activation, electrical, annealing, ion-implanted integrated circuits, 138... 

Figure 14 Raman/bright-field fused image of a thermally annealed AS 4- ion-implanted integrated-circuit region (polycrystalline) on a monocrystalline Si wafer (A) and LCTF Raman spectra from the poly crystalline and monocrystalline regions (B).

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