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Imaging Solvent processable

After image transfer, the patterned resist must be readily and completely removable without substrate damage. The pattern often can be stripped from the substrate with a mild organic solvent. Proprietary stripper formulations or plasma oxidation treatments are utilized when the imaging chemistry or image transfer process has iasolubilized the pattern. [Pg.114]

Figure 15.5 AFM images of QoN -MePH clusters obtained from CeoN and MePH in THF-H2O (2 1) mixed solvent on a mica surface in the absence (a) and presence of magnetic processing at 8T (b) at 283 K. Figure 15.5 AFM images of QoN -MePH clusters obtained from CeoN and MePH in THF-H2O (2 1) mixed solvent on a mica surface in the absence (a) and presence of magnetic processing at 8T (b) at 283 K.
See other pages where Imaging Solvent processable is mentioned: [Pg.40]    [Pg.621]    [Pg.310]    [Pg.50]    [Pg.621]    [Pg.621]    [Pg.109]    [Pg.115]    [Pg.621]    [Pg.302]    [Pg.98]    [Pg.396]    [Pg.657]    [Pg.2504]    [Pg.374]    [Pg.117]    [Pg.126]    [Pg.208]    [Pg.253]    [Pg.253]    [Pg.253]    [Pg.456]    [Pg.31]    [Pg.49]    [Pg.54]    [Pg.491]    [Pg.129]    [Pg.133]    [Pg.284]    [Pg.121]    [Pg.156]    [Pg.127]    [Pg.127]    [Pg.786]    [Pg.109]    [Pg.165]    [Pg.65]    [Pg.397]    [Pg.188]    [Pg.55]    [Pg.152]    [Pg.118]    [Pg.352]    [Pg.12]    [Pg.87]   
See also in sourсe #XX -- [ Pg.6 , Pg.7 , Pg.26 , Pg.26 ]



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