Image resolution concept

The Image Resolution Concept Monolayer and Multilayer Image Analysis... 

This diffraction limit prevents optical imaging beyond the micrometre scale. However, near-held optical microscopy (NFOM) avoids these limits by using ultra-miniaturised components. For example, it employs a light source of less than 100 nm diameter to overcome the diffraction limit of conventional optical microscopy. The main concept of NFOM is to place the sample very close to the light source, i.e. in the near held, so that the imaging resolution is determined by the narrow diameter of the light source. 

The detectability of critical defects with CT depends on the final image quality and the skill of the operator, see figure 2. The basic concepts of image quality are resolution, contrast, and noise. Image quality are generally described by the signal-to-noise ratio SNR), the modulation transfer function (MTF) and the noise power spectrum (NFS). SNR is the quotient of a signal and its variance, MTF describes the contrast as a function of spatial frequency and NFS in turn describes the noise power at various spatial frequencies [1, 3]. 

The concept of resolution in AFM is different from radiation-based microscopies because AFM imaging is a three-dimensional imaging technique. There is an important distinction between images resolved by wave optics and those resolved by scanning probe techniques. The former is limited by diffraction, whereas the latter is limited primarily by apical probe geometry and sample geometry. Usually the width of a DNA molecule is loosely used as a measure of resolution, because it has a known diameter of 2.0 nm in its B form. 

Similar to the failures of the free-electron model of metals (Ashcroft and Mermin, 1985, Chapter 3), the fundamental deficiency of the jellium model consists in its total neglect of the atomic structure of the solids. Furthermore, because the jellium model does not have band structure, it does not support the concept of surface states. Regarding STM, the jellium model predicts the correct surface potential (the image force), and is useful for interpreting the distance dependence of tunneling current. However, it is inapplicable for describing STM images with atomic resolution. 

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