Hydrothermal etching, quartz

Low temperature etching. Our data suggests that, under hydrothermal conditions the rate of pit formation is dramatically reduced, although perhaps not completely stopped, at C = Ccrjt. Etch pits on a natural, hydrothermally-etched quartz surface therefore indicate extended dissolution times, but not necessarily etching at C < Ccrit This is because the rate of etch pit formation even above Ccr t can be significant at elevated temperatures (as shown by crystal R9). However, at low temperatures, formation of etch pits when C > C would be less likely, and natural surfaces etched at low temperature should record the saturation state of the etching fluid. 

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