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Holography, surface-relief

Photoresists. These are used in holography because they can be employed to map holographic exposures into surface relief. This property is utilised in the production of embossing masters, reflection and transmission gratings and in computer generated holograms. [Pg.332]

Baldus, O., Leopold, A., Hagen, R., Bieringer, T., Ziiker, S. J. (2001). Surface relief gr.uings generated by pulsed holography a simple way to polymer nanostructures without isomeriz-mg side-chains./. Chem. Phys. 114, 1344-1349. [Pg.426]

Baldus O, Zilker SJ. 2001. Surface relief grating in photoaddressable pol5mers generated by cw holography. Appl Phys B 72 425 427. [Pg.84]

Kawatsuki N, Hamano K, Ono H, Sasaki T, Goto K (2007) Molecular-oriented photoalignment layer for liquid mystals. Jpn J Appl Phys 46 339-341 Kawatsuki N, Nishioka E, Emoto A, Ono H, Kondo M (2012) Blazed surface relief formation in azobenzene-eontaining polymtaie films by asymmetric polarization holography. Appl Phys Express 5 041601... [Pg.238]

See other pages where Holography, surface-relief is mentioned: [Pg.430]    [Pg.474]    [Pg.223]    [Pg.426]    [Pg.430]    [Pg.474]    [Pg.284]    [Pg.179]    [Pg.60]    [Pg.153]    [Pg.157]   


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Holography, surface-relief gratings

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