High ultrahigh throughput

Electrocatalytic activity of supported metal particles has been investigated on surfaces prepared in an ultrahigh vacuum (UHV) molecular beam epitaxy system (DCA Instruments) modified to allow high throughput (parallel) synthesis of thin-film materials [Guerin and Hayden, 2006]. The system is shown in Fig. 16.1, and consisted of two physical vapor deposition (PVD) chambers, a sputtering chamber, and a surface characterization chamber (CC), all interconnected by a transfer chamber (TC). The entire system was maintained at UHV, with a base pressure of 10 °mbar. Sample access was achieved through a load lock, and samples could be transferred... 

Ultrahigh Pressure Nano LC for High-Throughput Applications.364... 

The rakeless ultrahigh-rate thickeners use elevated tanks up to 20-m diameter. Advantages are no drive, high throughput rate, and the small footprint. Disadvantages are the height of the elevated tank. 

There are several advantages of MOCVD over MBE high purity can be achieved without the need for ultrahigh vacuum since the reaction takes place in the gas phase, the deposition rate can be controlled almost as well as with MBE, production costs are lower, and the higher throughput makes commercial production feasible. 

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