Gettering alkali ions

When phosphorus is added to Si02, in addition to gettering mobile alkali ions, it tends to reduce the intrinsic tensile stress in such films, thereby reducing their tendency to crack. Both functions are important when the film is used as a final passivation film for integrated circuits encapsulated in plastic. Phosphorus additions of 7 weight percent seem to be optimum in order to produce the above desirable film characteristics. 

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