Gas Laws and Kinetic Theory

The CVD techniques rely on the gases which are transported into a reaction chamber for deposition. In this chapter, the fundamental physics relating to these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pressures of some commonly used CVD reactant gases. 

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