Floating catalyst chemical vapor deposition

Kim, M. J. Chatterjee, S. Kim, S. M. Stach, E. A. Bradley, M. G. Pender, M. J. Sneddon, L. G. and Maruyama, B. Double-walled boron nitride nanotubes grown by floating catalyst chemical vapor deposition. Nano Lett., 2008,10, 3298-3302. 

The thermal decomposition of organic compounds can also be employed to generate small carbon clusters or atoms. The borderline with chemical vapor deposition (CVD) as presented in the next section is not really fix. In both cases, the method is based on the thermal decomposition of organic precursors. Processes both with and without catalyst have been reported. Contrary to the chemical vapor deposition, however, the catalyst (if applied) is not coated onto a substrate, but the substance or a precursor is added directly to the starting material ( floating catalyst ). The resulting mixture is then introduced into the reactor either in solid or in liquid state by a gas stream. From this point of view the HiPCo-process could also be considered a pyrolytic preparation of SWNT, but due to its importance it is usually regarded as autonomous method. 

A floating catalyst method, which has been used for the large-scale production of carbon nanotubes, was applied in the synthesis of double-walled BNNTs by Kim et al." Borazine was chosen as the precursor for BN formation because of its chemical composition (1 1 B/N ratio) and high volatility. In this catalytic chemical vapor deposition (CCVD) technique, a mixture of ammonia and nitrogen gas (in a flow ratio of 100 3 sscm), borazine vapor along with a nickelocene catalyst flowed... 

In this chapter, two fabrication methods of CNPs with chemical vapor deposition (CVD) and solution-based deposition are reviewed. The former describes the CNT forest by the catalyst silicon wafer and floating catalyst by tube furnace. The paper prepared via CVD is a good candidate for device areas because of its uniformity, thinness. 

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