Fine-line lithography

A Perspective on Resist Materials for Fine-Line Lithography... 

Although the bulk properties such as sensitivity (E0), contrast (y), and developer selectivity (n) discussed earlier represent characteristics of a resist, fine line lithography provides the most meaningful and precise judgment on the performance of a resist. 

N.D. Wittels, Tundamentals of electron and x ray lithography, in Fine Line Lithography, R. Newman, Ed., pp. 1 104, North Holland Pubhshing, Amsterdam (1980). 

Bowden M.J. and Thompson L.F. 1979. Resists for fine line lithography. Solid State TechnoL, 22(5), 72-82. 

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