F Disilane

Delahoy, A., Doele, B., Ellis, F., Ramaprasad, K., Tonon, T., and Van Dine, J., Amorphous Silicon Films and Solar Cells Prepared by Mercury-Sensitized Photo-CVD of Silane and Disilane, Materials Issues in Applications of Amorphous Silicon Technology, (D. Adler, et al., eds), MRS Proc., (49) 33-39 (1985)... 

Most of the electron and ion impact reactions that are included in this code are listed in Table II. Added to this are the elastic collisions SiHa -1- e [274] and H2 -f e [275], the recombination SiHJ + SiH 2SiH3 [214], and the charge exchange HJ -f H2 -1- H [193]. Note that disilane is not included. The... 

N,N, 1,1,2,2,8,8,9,9-Decamethyl-1,2,8,9-tetrasila[2.2](2,5)pyrrolo-phane (30) is prepared by a procedure similar to that applied to 28 and 29 through l,2-bis(A(-methylpyrrolyl)disilane 31 with slight modification of the reagents. The lithiation was performed with f-BuLi/ TMED. Under dilute conditions pyrrolophane 30 was obtained in 4% yield from 31 as air-stable colorless crystals besides a polymeric residue (35) (Scheme 7). 

Roenigk, K. F., Jensen, K. F., and Carr, R. W., Rice-Rampsperger-Kassel-Marcus theoretical prediction of high-pressure Arrhenius parameters by nonlinear regression Application to silane and disilane decomposition, J. Phys. Chem. 91, 5732 (1987). 

The disilane was introduced through the side arm into vessel C and the whole apparatus evacuated with heating. The disilane was then sublimed into D which was sealed off at B. A known quantity of TFIF was distilled into D, from the THF supply H, after which the rig was sealed off at E and F. Previous to this, a film of Li had been deposited in A (Garst and Zabotny, 1965). The solution of the disilane in THF was run into A which was then sealed off at G. The reaction was left to continue at 0 °C for one week, and the final, filtered solution was stored in a sealed ampoule at —25 °C. 

F. Transition Metal-substituted Disilanes and Related Compounds... 

Ab initio molecular orbital calculations have been carried out by Ignacio and Schlegel on the thermal decomposition of disilane and the fluorinated disilanes Si2H F6 17. Both 1,1-elimination of H2 or HF and silylene extrusion by migration of H and F atoms concerted with Si—Si bond cleavage were considered. The transition states for the extrusion reactions all involved movement of the migrating atom toward the empty p-orbital of the extruded silylene in the insertion which is the retro-extrusion (equation 5). 

Die Bezeichnungen a)—f) werden im folgenden so verwendet, daB sie fiir einen bestimmten Reaktionstyp charakteristisch sind und Vergleiche zwi-schen den Darstellungsverfahren der Disilan-Derivate gestatten. 

Using these reactions, triflation of an arylated disilane or trisilane followed by reaction with LiAlH4 or LiX (X = F, Cl), allows the preparation of a wide range of compounds. 

Table 2. Si and F NMR-shifts (ppm) and coupling constants (Hz) of the disilanes prepared from p-TolPhjSi-SiPhjp-Tol...

After 1.2 F moF of electricity had been passed through either A1 or Mg anode, the symmetrical coupling of monochlorosilanes (65 mmol) led, as expected, to the symmetrical disilanes (Eq. 8) in yields comparable to those from the metal route (Table 2). 

Table 3. Electrochemical synthesis of trisilanes Ph Me2- Si(SiMe3)2 (4.2 F mol passed) - comparison with the classical route [a] industrial disilane residue as the substrate...

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