Ellipsometry fundamental equation

We next seek the fundamental equation of ellipsometry. In the isotropic case (where /("and n are both scalar) the traceless 2x2 reflection matrix R is given by... 

This form of the Gibbs fundamental equation demonstrates the importance of surface and interfacial tension measurements of interfacial layers out of the adsorption equilibrium. These methods are the most frequently used techniques to follow the time-dependence of the adsorption process. However, for very slow processes, which occurs in systems with extremely small amounts of surfactants, other methods such as the radio-tracer technique and ellipsometry, or the very recently developed technique of neutron reflectivity, can be used to directly follow the change of surface concentration with time. 

Ellipsometry is based fundamentally on the Fresnel equations for the reflection and refraction of light at a sharp two-phase boundary. They can... 

In the broadest sense, ellipsometry is concerned with measurement and analysis ofthe state of elliptical polarization of light (Rothen, 1964). However, it is generally used to mean a method, based on analysis of elliptical polarization, to determine the properties of thin films (particularly the thickness) on dielectric or metal surfaces. The basic theory derives from the work of Lord Rayleigh and Paul Drude in the late 19 century. L(xd Rayleigh had inferred the presence of viscous films of minute thickness on water surfaces, and devised an experiment whereby the effect of these films on the polarization state of a reflected beam could be measured with great precision. Drude, meanwhile, was interested in the reflection of light from thin films oi solids, and derived, based on Maxwell s equations, the fundamental formulae on which ellipsometric instruments are based. 

In case of Figure 6(b), Maker fringes are the superposition of two components one is a sinusoidally oscillating component and the other is an envelope of minimum points of the first one. The former is exactly the same as the fused silica substrate. The latter is due to the film itself, and its intensity follows Equation (4). In the calculation it is necessary to know the refractive indicies of the film at the fundamental (1907 nm) and TH (635 nm) wavelengths, respectively. We measured n from the m-line at 1064 nm and from both the ellipsometry and... 

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