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Electroplating mass-transport limitation

This raises some important possibilities, which have not escaped the attention of the electroplating community. For example, while metal deposition is conducted in fairly concentrated solutions of the metal being plated, and at current densities well below the mass-transport limit, additives acting as inhibitors for metal deposition are often introduced at concentrations that are several orders of magnitude lower, to ensure that their supply to the surface will be mass-transport limited. In this way, the tendency for increased rate of metal deposition on certain features on the surface, such as protrusions, will be moderated by the faster diffusion of the inhibitor to the very same areas. Furthermore, if deposition occurs in the region of mixed control, which is usually the case, it must be remembered that the relevant roughness factor is quite different for the charge-transfer and the mass-transport processes, and this may well be a function of current density, since the Faradaic resistance is inherently potential dependent. [Pg.207]

The analysis of mass transfer in electrochemical cells requires the use of equations that describe the condition of electroneutrality (which applies for the entire elecnolyte outside the double layer at an electrode), species fluxes, mass conservation, current density, and fluid hydrodynamics. Often, mass transport events are rate limiting, as compared to kinetics processes at the electrode surface, in which case the overall electrode reaction rate is solely dependent on species mass transfer (e.g., during high-rate electroplating of some metals and for those elecnochemical reactions where the concentration of reactant in solution is low). [Pg.1754]

The quality of the product may be inferior near limiting-current conditions, e.g. in the case of electroplating, i < in order to avoid roughened deposits (section 8.1.2) or problems due to codeposition of metal oxide-hydroxide. The maximum current for acceptable electrodeposition is, however, strongly linked to ijL and enhancement of mass transport will often permit an increase in the rate of electroplating (or else a reduced time to obtain a given deposit... [Pg.109]


See other pages where Electroplating mass-transport limitation is mentioned: [Pg.195]    [Pg.228]    [Pg.30]    [Pg.63]    [Pg.322]    [Pg.654]    [Pg.835]    [Pg.315]    [Pg.1792]   


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