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Electron lines plasma etching

Figure 40. Electron lines from phosphine anchored catalyst as a function of oxygen plasma etching exposure. Figure 40. Electron lines from phosphine anchored catalyst as a function of oxygen plasma etching exposure.
Octadecyl methacrylate (ODMA) can be polymerized by electron beam irradiation (9). When ODMA is used as the monomer with PTCEM as the base polymer, the resolution and line profile of the PDE is poor. This poor performance may be in part due to the low glass transition temperature of poly(octadecyl methacrylate) (PODMA) and the small plasma etch rate difference between PODMA and PTCEM. [Pg.218]

See other pages where Electron lines plasma etching is mentioned: [Pg.80]    [Pg.71]    [Pg.191]    [Pg.2201]    [Pg.148]    [Pg.479]    [Pg.2767]    [Pg.2776]    [Pg.143]    [Pg.297]    [Pg.593]    [Pg.1673]    [Pg.1681]    [Pg.508]    [Pg.121]    [Pg.7]    [Pg.106]    [Pg.1023]    [Pg.109]    [Pg.169]    [Pg.253]    [Pg.2]    [Pg.307]    [Pg.342]    [Pg.229]    [Pg.22]    [Pg.112]    [Pg.257]    [Pg.90]    [Pg.92]    [Pg.109]    [Pg.2462]   
See also in sourсe #XX -- [ Pg.190 ]



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Electron lines

Etch plasma

Plasma etching

Plasma-etched

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