Electron curing description

Methods 1 and 3 have been utilized in dry developed resist systems. To our knowledge, there are no resist systems commercially available that depend on post-exposure treatment other than the post-curing effect in negative electron beam resists mentioned earlier. Since such systems are still largely in the research phase we will not discuss them here but rather refer the reader to the literature for more detailed descriptions (44-50). 

Storage stability can be further improved by addition of "stabilizers" which inhibit the dark reaction without retarding rate of cure. Materials fitting the description of Lewis Bases or electron-donor compounds are generally effective in inhibiting the dark reaction. Many compounds of this type, however, tend to quench the cationic reaction completely, so that curing does not occur even on exposure to ultraviolet radiation. 

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