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Dispersion of Supported Particles from XPS

Kerkhof and Moulijn [33] suggested that a supported catalyst may be modeled as a stack of sheets of support material, with cubic crystals representing the supported particles. They used this stratified layer model (as illustrated in Fig. 3.10b) to calculate the intensity ratio Ip /Is for electron trajectories perpendicular to the support sheets, assuming exponential attenuation of the electrons in the particles and the support. [Pg.54]

Kuipers and co-workers [34] developed this model further into the randomly oriented layer model. These authors argued that powdered catalysts contain a [Pg.54]

In this respect, Kuipers made an important point (as illustrated in Fig. 3.10c), namely that layers of thickness x which cover the support to a fraction 6, have the same dispersion as hemispheres of radius 2 x, or spheres with a diameter 3x. Even more interesting is the fact that these three particle shapes with the same surface-to-volume ratio give virtually the same fp/fs intensity ratio in XPS when they are randomly oriented in a supported catalyst The authors tentatively generalized the mathematically proven result to the following statement that we quote literally For truly random samples the XPS signal of a supported phase which is present as equally sized but arbitrarily shaped convex particles is determined by the surface/volume ratio. Thus, in Kuipers model the XPS intensity ratio fp/fs is a direct measure of the dispersion, independent of the particle shape. As the mathematics of the model is beyond the scope of this book, the interested reader [Pg.55]

In order to translate the XPS intensity ratios of Zr and Si into dispersions with Kuiper s model, the following input parameters are required  [Pg.57]

The result of the calculations is that the calcined catalysts obtained from nitrate have dispersions of between 5 and 15% only, whereas the Zr02 catalyst prepared from ethoxide has a favorable dispersion of 75 + 15% after calcination at 700 °C. The equivalent layer thickness for this system is 0.42 nm, and the support coverage about 27%. These results are summarized in Table 3.3. [Pg.57]


See other pages where Dispersion of Supported Particles from XPS is mentioned: [Pg.65]    [Pg.50]    [Pg.54]   


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