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Diphenylethyl methacrylate

Positive Electron-beam Resist of Poly (a-substituted Benzyl Methacrylate). The electron-beam resist behaviors of poly(a-substituted benzyl methacrylate)s are given in Table III. When the exposed resist films were developed with a mixture of MIBK and IPA, the sensitivities of these polymers were on the order of 10-4 C/cm2. When a dilute solution of sodium methoxide in methanol was used as a developer, the sensitivity was enhanced as compared with the former case, and increased with an increase in the bulkiness of the ester group of the polymer except for poly(a,a-diphenylethyl methacrylate). [Pg.402]

Figure 7 shows the difference infrared spectra between the unexposed and exposed poly methacrylates. It is clear that the amount of methacrylic acid units formed on exposure increases in the order of methyl, a-methylbenzyl and a,a-dimethylbenzyl methacrylate polymers, which is the same as the increasing order of sensitivity. The amount of acid group in exposed poly (<, < -diphenylethyl methacrylate) was lower than that in exposed polymer of a,a-dimethylbenzyl methacrylate. [Pg.410]

Figure 7. Difference infrared spectra between the polymethacrylates unexposed and exposed to the electron-beam of 1.6x10 4 C/cm2. (A) poly (methyl methacrylate) (B) poly(a-methylbenzyl methacrylate) (C) atactic poly(a,a-dimethylbenzyl methacrylate) (D) poly(a,a-diphenylethyl methacrylate). Figure 7. Difference infrared spectra between the polymethacrylates unexposed and exposed to the electron-beam of 1.6x10 4 C/cm2. (A) poly (methyl methacrylate) (B) poly(a-methylbenzyl methacrylate) (C) atactic poly(a,a-dimethylbenzyl methacrylate) (D) poly(a,a-diphenylethyl methacrylate).
Table V. 13C—Tj s (msec) for Poly(a,a-diphenylethyl methacrylate) and for a,a-Diphenylethyl Methacrylate Units of Poly(a,a-diphenylethylmethacrylate-co-methyl methacrylate) in Toulene-do at 100°C and 25 MHz... Table V. 13C—Tj s (msec) for Poly(a,a-diphenylethyl methacrylate) and for a,a-Diphenylethyl Methacrylate Units of Poly(a,a-diphenylethylmethacrylate-co-methyl methacrylate) in Toulene-do at 100°C and 25 MHz...
A similar improvement in sensitivity via copolymerization was observed in the copolymers of methyl methacrylate with a,a-dimethylbenzyl methacrylate (Table VI) and triphenylmethyl methacrylate (Table VII). In the former case the mechanism of sensitivity enhancement should be the same as that for the poly(a,a-diphenylethyl methacrylate-co-methyl methacrylate), although the enhancement of sensitivity with copolymerization is rather low. [Pg.416]

Poly(dodecyl methacrylate) Poly[oxy(2,6-diphenyl-l,4-phenylene)] Poly(l,2-diphenylethyl methacrylate) Poly(hexamethylene sebacamide)... [Pg.357]

The polymerization of TrMA is more precisely controlled with chiral ligands (+)- and (—)-2,3-dimethoxy-l,4-bis(dimethylamino)butane (DDB) to give an almost completely one-handed helical polymer with a narrow molecular weight distribution (Fig. 6). An analogous helical polymer (PDPyMMA) can be obtained from diphenyl-2-pyridylmethyl methacrylate (DPyMMA) [13], but this polymer shows a helix-helix inversion when its molecular weight is low [14]. No helical polymer was obtained from the less bulky monomer, 1,1-diphenylethyl methacrylate (DPEMA) [15]. [Pg.396]

Fig. 6 Structures of (-t-)- and (—)-2,3-dimethoxy-l,4-bis(dimethylamino)butane (DDB), diphenyl-2-pyridyhnethyl methacrylate (DPyMMA), and 1,1-diphenylethyl methacrylate (DPEMA)... Fig. 6 Structures of (-t-)- and (—)-2,3-dimethoxy-l,4-bis(dimethylamino)butane (DDB), diphenyl-2-pyridyhnethyl methacrylate (DPyMMA), and 1,1-diphenylethyl methacrylate (DPEMA)...
Second virial coefficient of poly(2,2-diphenylethyl methacrylate)... [Pg.842]


See other pages where Diphenylethyl methacrylate is mentioned: [Pg.705]    [Pg.400]    [Pg.412]    [Pg.413]    [Pg.413]    [Pg.415]    [Pg.416]    [Pg.82]    [Pg.81]    [Pg.122]    [Pg.346]    [Pg.705]    [Pg.826]    [Pg.826]    [Pg.619]    [Pg.860]    [Pg.842]    [Pg.842]    [Pg.842]    [Pg.842]    [Pg.842]    [Pg.842]    [Pg.842]    [Pg.2344]    [Pg.2416]    [Pg.256]    [Pg.1451]    [Pg.1453]   
See also in sourсe #XX -- [ Pg.396 ]




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