DG-Structured Poly pyrrole

Similarly to PEDOT, thick PPy films (1.5 pm) tended to form an about 10 nm thick semiporous layer covering the free film surface, while thin films (350 nm) did not exhibit this unwanted feature, compare Figs. 7.7 and 7.8. The same plasma etching conditions as used in Sect. 7.3.3 proved to be effective to remove this layer. The etch rate determined for nontemplated PPy films under these conditions was on the order of 0.1 pmmin .  

The sheet resistance of both nontemplated and double-gyroid-structured films was determined by measuring the current through a 1 cm long film section for a 

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