Development, positive photoresist performance

In this work, a quantitative evaluation method has been developed to measure photoresist sensitivity or speed (2,3) and process latitude (2,4) in order to compare positive photoresist performance under equivalent conditions. Performance data using this method will be reported and compared for an extensive group of first and second generation commercial photoresists. 

Thin film dissolution behavior has been the subject of stuity for many applications. In the case of positive photoresists, a number of techniques have been used to characterize the kinetics of dissolution (1-12). The earliest such e q>eriments were performed by exposing the resist to a solvent for a fixed time and then measuring the thidmess of the remaining film (2). From repeated measurements of this type, a bulk development rate could be determined. 

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