Detector Materials single chemical elements

Figure 12.5 A schematic diagram of some of the major elements of a typical low-pressure chemical vapor deposition system. Note that the entire process is typically contained within a safety enclosure because many of the reactants as process gases are either flammable or toxic. A toxic gas detector scans the interior of the enclosure, especially around the gas piping, for leaks. The scrubber reacts the source materials that are left over after passing through the reactor tube to render them harmless. Typically the valves for all sources are operated electronically so that the user does not need to open the safety enclosure except to load substrates on the susceptor. The system shown here includes a single substrate on a tilted susceptor. Batch processes are similar except in the arrangement of substrates in the reactor tube. Other reactor tube designs are also used. More specific reaction examples are given in Section 12.8.

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