Deprotection kinetics of representative resist polymer systems

1 Deprotection kinetics of representative resist polymer systems 

Infrared spectroscopy provides a convenient method for studying the deprotection kinetics of resist polymers. For example, the deprotection kinetics of some alicyclic polymer resist systems comprising (i) poly(methylpropyl bicyclo[2.2.1]-hept-5-ene-2-carboxylate-co-bicyclo[2.2.1]hept-5-ene-2-carboxylic acid) (trivial name poly(carbo-t-butoxynorbomene-co-norbornene carboxylic acid) [poly(CBN-co-NBCA)] (I) and (ii) poly(methylpropyl bicyclo[2.2.1]hept-5-ene-2-carboxylate-co-maleic anhydride) (trivial name poly(carbo-t-butoxynorbomene-co-maleic anhydride) [poly(CBN-aZr-MAH)] (11) and containing triphenylsulfonium 

On exposure to UV radiation, the PAG decomposes with a rate constant to produce the photoacid (designated as Acid), as illustrated in Reaction [11.2]. Here, hv represents photon energy, where h is Planck s constant and v is the frequency of the radiation. 

Okoroanyanwu, J.D. Byers, T. Cao, S.E. Webber, and C.G. Willson, Deprotection kinetics of aUcycUc polymer resist systems designed for ArF (193 nm) Uthography in Polymers for Micro and Nano Patterning Science and Technology, H. Itoh, E. Reichmanis, O. Nalamasu, T. Ueno, Eds., pp. 174 190, American Chemical Society, Washington, DC (1998). 

Okoroanyanwu, J.D. Byers, T. Shimokawa, and C.G. Willson, AUcyclic pol3miers for 193 nm resist appUcations Uthographic evaluation Chem. Mater. 10(11), 3328 3333 (1998). 

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