Deposition system, schematic representation

A method which uses supercritical fluid/solid phase extraction/supercritical fluid chromatography (SE/SPE/SEC) has been developed for the analysis of trace constituents in complex matrices (67). By using this technique, extraction and clean-up are accomplished in one step using unmodified SC CO2. This step is monitored by a photodiode-array detector which allows fractionation. Eigure 10.14 shows a schematic representation of the SE/SPE/SEC set-up. This system allowed selective retention of the sample matrices while eluting and depositing the analytes of interest in the cryogenic trap. Application to the analysis of pesticides from lipid sample matrices have been reported. In this case, the lipids were completely separated from the pesticides. 

FIG. 5. Schematic representation of the ASTER deposition system. Indicated are (I) load lock. (2) plasma reactor for intrinsic layers. (3) plasma reactor for />-type layers. (4) plasma reactor for t -type layers, (5) metal-evaporation chamber (see text). (6) central transport chamber. (7) robot arm. (8) reaction chamber, (9) gate valve, (10) gas supply. (11) bypass. (12) measuring devices, and (13) tur-bomolecular pump. 

Fig. 100. Schematic representation of the different semiconductor-coated BLMs. A single composition of particulate semiconductor deposited only on one side of the BLM constituted System A. Two different compositions of particulate semiconductors sequentially deposited on the same side of the BLM represent System B. Finally, two different compositions of particulates deposited on the opposite sides of the BLM made up System C [652]...

Figure 4.4.1 Schematic representation of the model systems discussed within the chapter (A) nanoparticle growth influenced by dopants in the support, (B) nanoparticle deposition from solution, (C) strong metal support interaction, and (D) photochemistry at supported nanoparticles as a function of size.

Figure 11 Schematic representation of biogeochemical cycling of aryl (a) and alkyl (b) organohalides in environmental systems (the thickness of the arrows indicate the relative importance of each process or pathway note that the net flux of alkyl halides is towards volatilization, that of aryl halides towards deposition).

Figure 17 Main results obtained by combined LEED and XPD measurements on the Sn/Pt(l 11) system. The left row is a schematic representation of the surface structure. The center row shows the XPD results for the SnSds/i peak. The absence of oscillations in the pattern indicates either a disordered surface ( as deposited ) or a single atomic layer (after high temperature annealing) where forward scattering effects cannot play a role. The right row shows the LEED results corresponding to the. structural models described in the text. From [37].

Fig. 1. Schematic representation of vacuum furnace closed-cycle helium refrigeration system used for metal vapor microsolution optical spectroscopy, as well as conventional metal vapor-matrix isolation experiments. (A) NaCl or Suprasil optical window, horizontal configuration (B) stainless steel vacuum shroud (C) NaCl or Suprasil optical viewing ports (D) cajon-rubber septum, liquid or solution injection port (E) gas deposition ports (F) vacuum furnace quartz crystal microbalance assembly. With the optical window in a fixed horizontal configuration, liquid or solution sample injection onto the window at any desired temperature in the range 12-300 K is performed in position 1A, metal deposition is conducted in position IB, and optical spectra are recorded in position 1C see Procedure).

Fig. II.1.24 Schematic representation of three types of electrochemical systems with two phases, a and in contact with the electrode surface, (a) Film deposit (b) island deposit with three-phase boundary regions and (c) emulsion system...

Figure 6 Schematic representation of the thin film and droplet deposits that govern the sonovoltammetric response for electrochemical processes in acoustic emulsion systems.

Fig. 1.2 Schematic representation of CV curves accounting for the electrocatalytic process induced by a species anchored at the electrode. Peak 2 irreversible oxidation of B to A at the bare electrode peak system 1 reversible C/D system in the absence of B peak 3 electrocatalysed oxidation of B to A by mediation of C. The shift of peak 3 with respect to peak 1 is due to the reaction of the charge transfer product, C. No backward peak due to C reduction is recorded, admitting that the redox reaction C + B is fast enough. The symmetric peak system is ty pical of surface processes, i.e., of a monolayer electroactive deposit...

FIGURE 15.14 Electroless deposition of An nanoparticles by the feedback mode of SECM. (a) Schematic representation of the system, (b) SEM images (different magnifications) of the locally deposited An micro- and nanostructures. (From Malel, E. and Mandler, D., J. Electrochem. Soc., 155, D459, 2008. With permission.)... 

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