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CVD of TBCCO

CVD growth of TBCCO thin films was first reported by Marks et al. [271] at Northwestern University, and Erbil et al. [272] at Georgia Institute of Technology, who deposited on single-crystal YSZ and sapphire substrates, respectively. Marks et al. [Pg.121]


CVD of TBCCO Thin Films on Single Crystal Substrates.121... [Pg.38]

Table 2-8. Experimental conditions for and superconducting properties of TBCCO thin films grown by CVD. [Pg.130]

Researchers at Advanced Technology Materials (ATM) and Los Alamos National Laboratory (LANL) have focused on the CVD synthesis of Tl-2212 thin films on MgO substrates [277]. Fluorinated MOCVD precursors were used to grow Ba-Ca-Cu-O (F) thin films which were then annealed in the presence of H2O/O2 to promote fluoride evolution. The films were placed face down between two TBCCO pellets and annealed. The resultant superconducting films exhibited average electrical properties with Tc = 108 K and 7. = 1 x in Acm at 90 K. [Pg.128]


See other pages where CVD of TBCCO is mentioned: [Pg.38]    [Pg.38]    [Pg.121]    [Pg.128]    [Pg.129]    [Pg.38]    [Pg.38]    [Pg.121]    [Pg.128]    [Pg.129]    [Pg.619]    [Pg.38]    [Pg.121]    [Pg.121]    [Pg.128]    [Pg.129]    [Pg.129]    [Pg.129]    [Pg.132]    [Pg.48]    [Pg.69]    [Pg.71]    [Pg.128]    [Pg.129]   


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CVD

CVD of TBCCO Thin Films on Single Crystal Substrates

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