Current status of photoalignment

Ushio Ltd. in Japan developed a light source for photoalignment exposure. Its basic configuration is the same as for photolithography. However, photoalignment requires a large exposure area and a polarization element. Ushio s equipment uses 

Manufacture Name Main material Alignment Wavelength of exposure (nm) Coating process 

Elsicon (USA) OptoAlign Polyimide Parallel, vertical 360 Same as polyimide 

Rolic (Switzerland) LPP Dimerization material Parallel, vertical 320 Baking time is shorter than for polyimide 

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