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Curing process distribution, generation

In general, upon exposure to UV radiant energy, a photoinitiator can generate free radicals or ions, as pointed out earlier. These are generated at a rapid rate, and their depth profile corresponds to the inverse photon penetration profile. Similar to electron penetration, the final cure profile often deviates from the initial radical or ion distribution, since they can live much longer than the exposure time. The mechanisms of the processes for the generation of reactive species are discussed in detail in Davidson. ... [Pg.66]

Carlone and Palazzo (2008) developed a computational modelling of microwave assisted pultrusion. This model is based on an electromagnetic submodel, meant to evaluate the electric field distribution and the heat generation rate due to the microwave source and on a thermochemical submodel, used to determine the temperature and degree of cure distributions. The performed simulations revealed the relevance of design of the microwave cavity, the curing die, and the importance of the dielectric properties of the materials in microwave pultrusion process. [Pg.400]

See other pages where Curing process distribution, generation is mentioned: [Pg.299]    [Pg.365]    [Pg.151]    [Pg.468]    [Pg.600]    [Pg.28]    [Pg.39]    [Pg.83]    [Pg.20]    [Pg.97]    [Pg.260]    [Pg.607]    [Pg.111]    [Pg.39]    [Pg.83]    [Pg.300]    [Pg.356]    [Pg.356]    [Pg.139]    [Pg.291]    [Pg.325]    [Pg.7962]    [Pg.358]    [Pg.249]    [Pg.326]    [Pg.6]    [Pg.183]    [Pg.83]   
See also in sourсe #XX -- [ Pg.98 ]



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