Configuration of a Chemical Vapour Deposition Apparatus

Regardless of the number of CVD types discussed above, a CVD system must meet the following four basic requirements [12-14]  

to deliver and control all of the precursor gas, carrier gas and the diluent gas into the reaction chamber  

to provide an energy source to initiate and drive the chemical reaction  

to remove the by-product exhaust gases from the reaction chamber and to dispose them safely  

to precisely control the process parameters (temperature, pressure, gas flow rate) automatically so that the quality of deposited products and the reproducibility can be maintained from run to run. 

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