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Chemical vapor deposition, photogenerated

Surface-Imaging Resists Using Photogenerated Acid-Catafyzed Si02 Formation by Chemical Vapor Deposition... [Pg.180]

Figure 1 shows the surface imaging system using photogenerated add-catalyzed SiOj formation by the chemical vapor deposition (CVD) method. Upon irradiation with UV light the surface of polymers having imino sulfonate units becomes hydrophilic because of the formation of sulfonic add. Water sorption firom the atmosphere occurs at the top surface of the irradiated films. When the irradiated surface is exposed to the vapor of alkoxysUanes, a silicon oxide network is formed at the near surface of Ae polymers. No silicon oxide network is formed at unirradiated areas... [Pg.181]

Figure 1. Surface imaging scheme using photogenerated add-catalyzed Si02 formation 1 chemical vapor deposition. Figure 1. Surface imaging scheme using photogenerated add-catalyzed Si02 formation 1 chemical vapor deposition.

See other pages where Chemical vapor deposition, photogenerated is mentioned: [Pg.106]    [Pg.476]    [Pg.272]    [Pg.470]   


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